Company Filing History:
Years Active: 2018
Title: Innovations of Toshihiko Oono in Sevoflurane Production
Introduction
Toshihiko Oono is a notable inventor based in Yamaguchi, Japan. He has made significant contributions to the field of chemical engineering, particularly in the production of sevoflurane, an important anesthetic agent. His innovative methods aim to enhance the purity of sevoflurane, which is crucial for its effectiveness in medical applications.
Latest Patents
Oono holds a patent for a method of producing sevoflurane that effectively removes a compound known as fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether. The patent outlines a process that involves contacting a composition containing hydrogen fluoride and water with an organic liquid containing sevoflurane and the unwanted compound. This method results in a high-purity sevoflurane product, free from the contaminating compound.
Career Highlights
Toshihiko Oono is associated with Central Glass Company, Limited, where he has been instrumental in advancing the company's research and development efforts. His work has not only contributed to the company's portfolio but has also had a positive impact on the medical field by improving anesthetic formulations.
Collaborations
Oono has collaborated with several talented individuals in his field, including Takaaki Yoshimura and Shinya Akiba. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective projects.
Conclusion
Toshihiko Oono's contributions to the production of sevoflurane highlight his innovative spirit and dedication to improving medical technologies. His patent reflects a commitment to enhancing the quality of anesthetic agents, which is vital for patient safety and care.