Tokyo, Japan

Toshihiko Fujinaka


 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshihiko Fujinaka

Introduction

Toshihiko Fujinaka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced laminates. His work focuses on creating materials that exhibit exceptional properties, making them suitable for various applications.

Latest Patents

Fujinaka holds a patent for a laminate, along with a method for producing the same and its use. The laminate consists of a first layer formed from a first resin composition containing a first resin, and a second layer made from a second resin composition containing a second resin. These layers are in contact with each other and are integrated. The first resin includes an alicyclic polyamide resin with 20 mmol/kg or greater of amino groups, while the second resin features an acid-modified (meth)acrylic resin, which may have 100 mmol/kg or greater of carboxyl groups. The laminate is designed to have excellent transparency, lightness, light resistance, and impact resistance, with a DuPont impact strength of 500 N/inch or greater.

Career Highlights

Fujinaka is currently employed at Polyplastics-Evonik Corporation, where he continues to innovate and develop new materials. His expertise in resin compositions and laminate technology has positioned him as a key figure in his field.

Collaborations

Fujinaka collaborates with Daisuke Fujiki, a fellow innovator, to further enhance the capabilities and applications of their inventions. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Toshihiko Fujinaka's contributions to laminate technology demonstrate his commitment to advancing materials science. His innovative approach and successful patent highlight the potential for new applications in various industries.

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