Location History:
- Ichihara, JP (2008 - 2016)
- Chiba, JP (2016)
Company Filing History:
Years Active: 2008-2016
Title: Toshiaki Takahashi: Innovator in Organosilicon Compounds
Introduction
Toshiaki Takahashi is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of organosilicon compounds, holding a total of 4 patents. His work focuses on developing innovative materials with improved physical properties.
Latest Patents
Takahashi's latest patents include an organosilicon compound and a thin film forming composition. The invention aims to provide a novel organosilicon compound represented by the formula (I) R—(CH)—SiX(I). In this formula, R represents an alkoxy group with 1 to 3 carbon atoms or a phenyl group that may have a substituent. X can be a hydroxyl group or a hydrolyzable group, while n is any integer from 17 to 24. The organic thin film can be created by mixing the organosilicon compound with a compatible compound and water in an organic solvent, followed by contact with a substrate.
Career Highlights
Takahashi is currently employed at Nippon Soda Co., Ltd., where he continues to innovate in the field of organosilicon compounds. His work has been instrumental in advancing the technology related to organic thin films.
Collaborations
Some of his notable coworkers include Tomoya Hidaka and Daisuke Asanuma. Their collaborative efforts contribute to the ongoing research and development in their field.
Conclusion
Toshiaki Takahashi is a key figure in the development of organosilicon compounds, with a focus on enhancing the properties of organic thin films. His contributions are paving the way for future innovations in material science.