Company Filing History:
Years Active: 2003
Title: Toshiaki Kitazoe: Innovator in Hydrophilicity Technology
Introduction
Toshiaki Kitazoe is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods to enhance the hydrophilicity of substrates. His innovative approach has implications for various applications in industries that require materials with superior water-holding properties.
Latest Patents
Toshiaki Kitazoe holds a patent for a method that imparts hydrophilicity to substrates. The patent, titled "Method for imparting hydrophilicity to substrate," describes a process where a silicon oxide (SiO) film is formed on a substrate under reduced pressure conditions. This method ensures that high hydrophilic properties and water-holding capabilities are maintained over extended periods. The process involves treating the SiO film with water immediately after its formation, which enhances its performance.
Career Highlights
Kitazoe is associated with Nippon Sheet Glass Company, Limited, where he has been instrumental in advancing research and development in hydrophilic materials. His work has not only contributed to the company's portfolio but has also positioned it as a leader in innovative glass technologies.
Collaborations
Throughout his career, Toshiaki Kitazoe has collaborated with esteemed colleagues, including Keisuke Tanaka and Kenji Murata. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Toshiaki Kitazoe's contributions to the field of hydrophilicity technology exemplify the impact of innovative thinking in materials science. His patent and work at Nippon Sheet Glass Company, Limited, highlight the importance of research and collaboration in driving advancements in this area.