Tokyo, Japan

Toshiaki Kakemura



Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 45(Granted Patents)


Location History:

  • Tokyo, JP (1993 - 1999)
  • Koshigaya, JP (2011)

Company Filing History:


Years Active: 1993-2011

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3 patents (USPTO):Explore Patents

Title: Toshiaki Kakemura: Innovator in Thin Film Technology

Introduction

Toshiaki Kakemura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of thin film technology, holding three patents that showcase his innovative approaches. His work primarily focuses on methods and apparatuses for forming thin films, which have applications in various industries.

Latest Patents

Kakemura's latest patents include a method for forming thin films, an apparatus for forming thin films, and a method for monitoring the thin film forming process. One of his notable inventions is a thin film forming method that plasmatizes a mixture gas composed of a monomer gas and an oxidizing reactive gas. This method allows for the formation of a thin film on a substrate's surface, specifically an oxide thin film. The process involves creating a first thin film by adjusting the supply flow amount ratio of the monomer gas relative to the reactive gas, followed by forming a final thin film by increasing this ratio after the initial film is created. Additionally, he has developed a compound container that can be completely separated into paper and plastics upon disposal, which significantly reduces waste volume and enhances resistance to impact.

Career Highlights

Kakemura is associated with Toppan Printing Co., Ltd., where he has been instrumental in advancing thin film technologies. His work has not only contributed to the company's innovation portfolio but has also positioned Toppan as a leader in the field.

Collaborations

Throughout his career, Kakemura has collaborated with notable colleagues, including Katsuyuki Ohno and Terutaka Iwasaki. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Toshiaki Kakemura's contributions to thin film technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving processes and materials, making a lasting impact on the industry.

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