Company Filing History:
Years Active: 2001-2006
Title: Toru Nishiwaki: Innovator in Semiconductor Fabrication
Introduction
Toru Nishiwaki is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor device fabrication. With a total of 2 patents to his name, Nishiwaki's work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Nishiwaki's latest patents include innovative methods for fabricating semiconductor devices. The first patent describes a method where a nonmetal element is distributed in a region near the surface of a semiconductor layer. Following this, a metal film is deposited on the semiconductor layer. A semiconductor-metal compound layer is then epitaxially grown by inducing a reaction between elements in the semiconductor layer and the metal film through annealing. The second patent outlines a process involving wafers with MOS semiconductor components. These wafers are introduced into a single-wafer heat treatment system, where they undergo a series of steps including hydrogen introduction, heating, sintering, and cooling. This method significantly improves throughput and uniformity compared to conventional processes.
Career Highlights
Nishiwaki is currently employed at Matsushita Electric Industrial Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor fabrication processes.
Collaborations
Some of Nishiwaki's coworkers include Shin Hashimoto and Takenobu Kishida. Their collaborative efforts contribute to the advancement of semiconductor technologies.
Conclusion
Toru Nishiwaki's contributions to semiconductor device fabrication highlight his role as an influential inventor in the field. His innovative methods and patents continue to shape the future of semiconductor technology.