Location History:
- Ibaraki, JP (1989)
- Kanagawa, JP (1993)
- Kawasaki, JP (1996)
- Tokyo, JP (2000)
- Ibaraki-ken, JP (2001)
- Setagaya-ku, JP (2009)
Company Filing History:
Years Active: 1989-2009
Title: Innovations by Toru Nakanishi
Introduction
Toru Nakanishi is a prominent inventor based in Setagaya-ku, Japan. He has made significant contributions to the field of adhesive technologies, holding a total of eight patents. His work focuses on developing flame retardant adhesive compositions that enhance safety and performance in various applications.
Latest Patents
Nakanishi's latest patents include a flame retardant adhesive composition that features a halogen-free epoxy resin, thermoplastic resin and/or synthetic rubber, curing agent, nitrogen-containing polyphosphate compound, and curing accelerator. This innovative composition is designed to yield a cured product with excellent flame retardancy and anti-migration properties. Additionally, he has developed an adhesive sheet, coverlay film, and flexible copper-clad laminate utilizing this composition. These products are essential for bonding substrates and ensuring electrical insulation in various electronic applications.
Career Highlights
Toru Nakanishi is associated with Shin-Etsu Chemical Co., Ltd., where he has been instrumental in advancing adhesive technologies. His expertise in creating halogen-free adhesive compositions has positioned him as a leader in the field. His patents reflect a commitment to innovation and safety in materials used in electronics and other industries.
Collaborations
Nakanishi has collaborated with notable coworkers, including Kazuhiro Hirahara and Shigehiro Hoshida. Their combined efforts have contributed to the development of advanced adhesive solutions that meet the demands of modern technology.
Conclusion
Toru Nakanishi's contributions to adhesive technology through his innovative patents demonstrate his dedication to enhancing safety and performance in various applications. His work continues to influence the industry and pave the way for future advancements.