Dresden, Germany

Toralf Grützner

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Sig Technology Ag. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toralf Grützner. Retrieved from https://idiyas.com/inventor/toralf-grützner

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Toralf Grützner

Introduction

Toralf Grützner is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of container filling technology. His innovative approach has led to the development of a unique method and device for filling containers with liquid products.

Latest Patents

Grützner holds a patent for a "Filling method and device." This invention involves a method and device designed to fill containers with a liquid product efficiently. The product is delivered to the container through a filling valve and a filling nozzle. The liquid emerging from the filling nozzle is directed by a specially designed directing element. This element is geometrically configured to maintain a small distance from the inside walls of the container, ensuring precise filling.

Career Highlights

Toralf Grützner is associated with Sig Technology AG, where he has been instrumental in advancing filling technologies. His work has not only improved efficiency but also enhanced the quality of the filling process in various applications.

Collaborations

Grützner has collaborated with notable colleagues, including Jörg Berger and Werner Seiche. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Toralf Grützner's contributions to filling technology exemplify the impact of innovative thinking in industrial applications. His patent and work at Sig Technology AG highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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