Yokohama, Japan

Tomoyo Naito


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Tomoyo Naito: Innovator in Impurity Analysis Technology

Introduction

Tomoyo Naito is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of impurity analysis, particularly through his innovative patent. His work is essential for advancing technologies that require precise material analysis.

Latest Patents

Tomoyo Naito holds a patent for an "Impurity analysis device and method." This invention involves a sophisticated process that includes vapor-phase decomposition on a silicon-containing film. The method entails heating the substrate at two different temperatures to remove silicon compounds and recover metals for analysis. This process culminates in X-ray fluorescence spectrometry on a dried mark, showcasing the effectiveness of his invention.

Career Highlights

Naito is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His role at Toshiba has allowed him to focus on developing advanced analytical methods that enhance the understanding of material properties.

Collaborations

Tomoyo Naito collaborates with talented individuals such as Yuji Yamada and Makiko Katano. Their teamwork contributes to the innovative environment at Toshiba, fostering advancements in technology.

Conclusion

Tomoyo Naito's contributions to impurity analysis technology exemplify the importance of innovation in scientific research. His patent reflects a commitment to enhancing material analysis methods, which is crucial for various technological applications.

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