Tomoyasu Sunaga

Title: Innovations of Tomoyasu Sunaga

Introduction

Tomoyasu Sunaga is a notable inventor based in Tochigi, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced polyimide resins. With a total of three patents to his name, Sunaga's work has implications for various applications in technology and manufacturing.

Latest Patents

Sunaga's latest patents include a novel polyimide resin and a photosensitive polyimide resin composition. The polyimide resin is formed by imidizing a diamine component that includes an amide group-containing siloxane diamine compound. This compound is represented by a specific formula and is combined with an acid dianhydride component, such as 3,3',4,4'-diphenylsulfone tetracarboxylic dianhydride. The innovation lies in the introduction of a reaction group capable of forming a crosslinking point before imidization, which enhances the properties of the resulting resin. Additionally, he has developed an amide group-containing siloxane amine compound that serves as a diamine component for polybenzimidazole and polybenzoxazole resins, particularly polyimide resins.

Career Highlights

Throughout his career, Sunaga has worked with prominent companies, including Sony Chemical and Information Device Corporation and Ihara Chemical Industry Co., Ltd. His experience in these organizations has allowed him to refine his expertise in chemical engineering and materials development.

Collaborations

Sunaga has collaborated with notable colleagues such as Junichi Ishii and Hiroki Kanaya. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Tomoyasu Sunaga's innovative work in polyimide resins showcases his significant contributions to materials science. His patents reflect a commitment to advancing technology through novel chemical compositions.