Company Filing History:
Years Active: 1986-1987
Title: The Innovations of Tomonobu Muta
Introduction
Tomonobu Muta is a notable inventor based in Urawa, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 3 patents. His work focuses on developing advanced image-forming materials that have applications in various technologies.
Latest Patents
Muta's latest patents include a photosensitive image-forming material that features a layer of photosensitive resin. This resin is created through the reaction of a hydroxyl-containing polyester precursor, which is composed of dicarboxylic acid units derived from a dicarboxylic acid with a photosensitive unsaturated double bond adjacent to an aromatic ring. Another notable patent involves a photosensitive image-forming material that is developable with aqueous alkali developers. This material is characterized by a photosensitive resin containing structural units that enhance its performance in image formation.
Career Highlights
Tomonobu Muta is currently employed at Dainippon Ink and Chemicals, Incorporated, where he continues to innovate in the field of photosensitive materials. His work has been instrumental in advancing the technology used in various imaging applications.
Collaborations
Muta has collaborated with several talented individuals in his field, including Chiaki Nakamura and Toshiki Sasaki. These collaborations have contributed to the development of his innovative patents and have fostered a creative environment for research and development.
Conclusion
Tomonobu Muta's contributions to the field of photosensitive materials highlight his role as a leading inventor in Japan. His innovative patents and collaborations reflect his commitment to advancing technology in this area.