Himeji, Japan

Tokumasa Ishida

USPTO Granted Patents = 15 

 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Himeji, JP (2002 - 2012)
  • Hyogo, JP (2018)

Company Filing History:


Years Active: 2002-2018

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15 patents (USPTO):Explore Patents

Title: Tokumasa Ishida: Innovator in Hydroxyalkyl Acrylate Production

Introduction

Tokumasa Ishida is a prominent inventor based in Himeji, Japan. He has made significant contributions to the field of chemical engineering, particularly in the production of hydroxyalkyl acrylates. With a total of 15 patents to his name, Ishida's work has had a considerable impact on the industry.

Latest Patents

Ishida's latest patents include innovative methods for producing hydroxyalkyl acrylates. One notable patent describes a hydroxyalkyl acrylate characterized by a content amount of an ester generated from acrylic acid dimer and an alkylene oxide that is not more than 0.10 mass percent. Another patent outlines processes for producing hydroxyalkyl (meth) acrylates, which involve reacting (meth)acrylic acid with an alkylene oxide in the presence of a catalyst. These processes are designed to optimize the reaction conditions and improve the efficiency of production.

Career Highlights

Tokumasa Ishida is currently employed at Nippon Shokubai Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the production techniques of hydroxyalkyl acrylates, contributing to the company's reputation as a leader in the chemical industry.

Collaborations

Ishida has collaborated with notable colleagues, including Yasuhiro Shingai and Yukihiro Yoneda. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Tokumasa Ishida's contributions to the field of hydroxyalkyl acrylate production exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to shape the future of chemical engineering.

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