Company Filing History:
Years Active: 1999-2001
Title: Tohru Aoyama: Innovator in Semiconductor Technology
Introduction
Tohru Aoyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative methods have advanced the fabrication processes of semiconductor devices, enhancing their efficiency and performance.
Latest Patents
One of Aoyama's latest patents is a method of fabricating a semiconductor device that includes the formation of an insulating film and an electrically conductive film on a silicon substrate. This method involves creating openings in these films to form tunnel portions, allowing for the growth of a SiGe base epitaxial layer. The process gas used for this growth includes disilane, and the etching gas is chlorine, with a specific ratio that optimizes the growth temperature. This innovative approach results in a SiGe base epitaxial layer that is thinner in the center, ensuring a higher operation rate of bipolar transistors.
Another notable patent focuses on reducing boron contamination during integrated circuit fabrication. Aoyama's method involves pretreating the silicon substrate to prevent boron contamination in a clean room environment. Additionally, he proposes cleaning the CVD growth chamber using fluorine gas to eliminate boron residues before substrate loading. This technique significantly enhances the quality of the epitaxially grown layers.
Career Highlights
Tohru Aoyama is currently associated with NEC Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing methods that improve the performance and reliability of semiconductor devices.
Collaborations
Aoyama has collaborated with notable colleagues such as Tatsuya Suzuki and Seiichi Shishiguchi. Their combined expertise has contributed to the advancement of innovative solutions in the semiconductor industry.
Conclusion
Tohru Aoyama's contributions to semiconductor technology through his patents and collaborative efforts have made a significant impact on the industry. His innovative methods continue to pave the way for advancements in semiconductor fabrication processes.