Merchweiler, Germany

Tobias Dörr


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Inventor Spotlight: Tobias Dörr

Introduction

Tobias Dörr is an innovative inventor based in Merchweiler, Germany. He has made significant contributions in the field of materials science, specifically focusing on methods for producing metallic coatings. His work exemplifies the intersection of creativity and technical expertise, contributing to advancements in various applications.

Latest Patents

Dörr holds a patent for a "Method for producing patterned metallic coatings." This innovative method involves an initiator composition with at least one active substance, which is added to a substrate. A precursor composition containing at least one precursor compound for a metallic layer is then applied. Following this, a metallic layer is deposited using the active substance. To achieve a distinct patterning of the finished metallic layer, at least one composition is utilized as an emulsion.

Career Highlights

Tobias is a notable member of the Leibniz Institute for New Materials, a prominent research institution known for its focus on advanced material development. His role allows him to engage in cutting-edge research, furthering the capabilities and applications of new materials.

Collaborations

He works alongside talented individuals such as Peter William De Oliveira and Karsten Moh, contributing to a collaborative environment that fosters innovation and creativity. These partnerships enable the team to explore new ideas and tackle complex challenges in the field of materials science.

Conclusion

Tobias Dörr represents the spirit of innovation through his patent and ongoing work at the Leibniz Institute for New Materials. His contributions not only enhance the understanding and use of metallic coatings but also inspire future inventors in the realm of materials science.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…