Company Filing History:
Years Active: 2023
Title: Innovations of Ting-Wei Chang
Introduction
Ting-Wei Chang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photoresist compositions for semiconductor manufacturing. His innovative approach has led to advancements in the quality and efficiency of patterned polyimide layers.
Latest Patents
Ting-Wei Chang holds a patent for a "Method of forming patterned polyimide layer." This invention provides a method for creating a patterned polyimide layer using a positive photoresist composition. The composition includes a cresol-type novolac resin, a diazonaphthoquinone-based sensitizer, and an organic solvent. The specific formulation ensures excellent chemical resistance to polyimide strippers and enhances the protective ability of the photoresist layer, optimizing the manufacturing process and quality of the patterned polyimide layer. He has 1 patent to his name.
Career Highlights
Ting-Wei Chang is associated with Echem Solutions Corp., where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the capabilities of photoresist materials used in the semiconductor industry.
Collaborations
Ting-Wei Chang collaborates with Ming-Che Chung, contributing to the development of advanced materials and processes in their field.
Conclusion
Ting-Wei Chang's contributions to the field of materials science, particularly through his patented methods, highlight his role as an innovative inventor. His work continues to influence the semiconductor manufacturing industry, showcasing the importance of advancements in photoresist technology.