Tina J Cotler-Wagner

Title: Profile of Inventor Tina J Cotler-Wagner

Introduction: Tina J Cotler-Wagner is a prominent inventor based in Newburgh, NY, known for her innovative contributions to the field of materials science, particularly in photoresist formulations. She has developed a significant patent that addresses challenges in the etching process, promoting advancements in semiconductor manufacturing.

Latest Patents: Tina holds a patent for a resist formulation that minimizes blistering during etching. This invention improves the reactive ion etching processes by increasing the amount of polymer by-product deposition while effectively minimizing blister formation. The patent outlines a resist formulation that includes a resin binder, a terpolymer composed of approximately 70% 4-hydroxystyrene, 20% styrene, and 10% t-butylacrylate, enabling better performance during high-density plasma etching processes.

Career Highlights: Tina J Cotler-Wagner's noteworthy career includes her work at the International Business Machines Corporation (IBM), where she has significantly impacted research and development in materials for semiconductor applications. Her expertise has established her as a key figure in the innovation of high-performance photoresists.

Collaborations: Throughout her career, Tina has collaborated with esteemed coworkers such as Michael D Armacost and Willard E Conley, contributing to collective advancements in their field. These partnerships have fostered a collaborative environment that enhances innovation and the development of cutting-edge technologies.

Conclusion: Tina J Cotler-Wagner is an influential inventor whose work in photoresist formulations plays a vital role in semiconductor manufacturing. Her patented innovations not only showcase her expertise but also contribute to the ongoing evolution of materials used in the industry. As her career progresses, her contributions will undoubtedly continue to shape the future of technology.