Timothy J Leedham

Title: The Innovations of Timothy J Leedham

Introduction

Timothy J Leedham is a notable inventor based in Diss, Great Britain. He has made significant contributions to the field of chemical vapor deposition and metalorganic chemical vapor deposition (MOCVD) techniques. With a total of 2 patents, his work has advanced the development of materials used in various technological applications.

Latest Patents

Leedham's latest patents include innovative precursors for the growth of heterometal-oxide films by MOCVD. These metalorganic precursors are designed for the deposition of strontium tantalum and strontium niobium oxides, characterized by the formula Sr[M(OR)L], where x ranges from 1 to 6, M represents either Ta or Nb, R is a straight or branched chain alkyl group, and L is an alkoxide group. Additionally, he has developed chemical vapor deposition precursors for zirconium, which are utilized in depositing thin films of or containing zirconium oxide. The general formula for these precursors is Zr(OR)L, where R is an alkyl group, L is a β-diketonate group, and x, y, and z take specific values.

Career Highlights

Throughout his career, Timothy J Leedham has worked with prominent organizations, including the Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom and Qinetiq Limited. His expertise in the field has allowed him to contribute to various projects that enhance technological advancements.

Collaborations

Leedham has collaborated with notable colleagues such as Anthony Copeland Jones and Michael J Crosbie. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Timothy J Leedham's contributions to the field of chemical vapor deposition and MOCVD techniques highlight his role as an influential inventor. His patents and collaborations reflect his commitment to advancing technology and materials science.