Pinner, United Kingdom

Timothy G Morgan


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1992

Loading Chart...
1 patent (USPTO):Explore Patents

Title: **Timothy G. Morgan: Innovator in Ion Implantation Technology**

Introduction

Timothy G. Morgan, an accomplished inventor based in Pinner, GB, has made significant contributions to the field of ion implantation technology. With a keen focus on enhancing the efficiency and effectiveness of ion implantation systems, he holds one patent that underscores his innovative spirit and dedication to advancing scientific practices.

Latest Patents

Morgan's notable patent, titled "Improved Ion Implantation Using a Variable Mass Resolving System," represents a groundbreaking advancement in ion implantation systems. This invention modifies the existing technology to allow for variation in the size of the aperture of the mass resolving system. By enabling a broader range of ions, including isotopes, to pass through the opening, this innovation increases beam current and improves throughput during the implantation process. Additionally, it reduces contamination and enhances dosage control, making it a valuable asset for applications requiring precise ion implantation.

Career Highlights

Timothy G. Morgan currently works at Applied Materials, Inc., a leading company in the materials engineering sector. His expertise in ion implantation has made him a vital member of the team, contributing to the development of cutting-edge technologies that drive advancements in semiconductor manufacturing and other related fields.

Collaborations

Throughout his career, Morgan has collaborated with talented professionals, including Nicholas J. Bright and David Richard Burgin. These partnerships have fostered an environment of innovation and shared knowledge, further pushing the boundaries of what is possible in ion implantation technology.

Conclusion

Timothy G. Morgan’s innovative contributions to ion implantation systems illustrate the importance of creativity and technical excellence in the field of science and engineering. His patent showcases a commitment to improving processes and outcomes in the industry, positioning him as a key figure in the ongoing evolution of ion implantation technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…