Beijing, China

Tianmao Guo


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):

Title: Innovations by Tianmao Guo in Lidar Technology

Introduction

Tianmao Guo is a prominent inventor based in Beijing, China. He has made significant contributions to the field of metrology and measurement technology, particularly through his innovative work with three-dimensional lidar scanners. His expertise in this area has led to the development of a unique method for correcting coordinate errors, which enhances the accuracy of measurements in various applications.

Latest Patents

One of Tianmao Guo's notable patents is titled "Method for coordinate error correction with a three-dimensional lidar scanner." This patent addresses the challenges of measurement accuracy in three-dimensional coordinates by identifying error sources and implementing corrective measures. The method involves constructing a theoretical calculation model, analyzing measurement error sources, and building an error model that considers 26 different error factors. The resulting calculation expression incorporates various elements, including the amount of errors, azimuth angle, pitch angle, and distance, ultimately improving the performance of lidar scanners.

Career Highlights

Tianmao Guo is affiliated with the Beijing Aerospace Institute for Metrology and Measurement Technology. His work at this esteemed institution has allowed him to collaborate with other experts in the field, further advancing the development of innovative measurement technologies. His dedication to research and development has positioned him as a key figure in the realm of lidar technology.

Collaborations

Tianmao Guo has worked alongside talented colleagues such as Yinxiao Miao and Chenxing Bao. Their collaborative efforts have contributed to the advancement of measurement technologies and the successful implementation of innovative solutions in their field.

Conclusion

Tianmao Guo's contributions to the field of lidar technology through his innovative patent demonstrate his commitment to enhancing measurement accuracy. His work continues to influence the development of advanced metrology solutions, solidifying his reputation as a leading inventor in this domain.

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