Company Filing History:
Years Active: 2016
Title: Innovations by Tian-Yeu Wu in Chemical Mechanical Polishing
Introduction
Tian-Yeu Wu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, particularly through his innovative patent that addresses the challenges associated with magnetic abrasive particles.
Latest Patents
One of Tian-Yeu Wu's key patents is titled "Low Magnetic Chemical Mechanical Polishing Conditioner." This invention relates to a method for producing a low magnetic chemical mechanical polishing conditioner. The method involves providing a substrate, a bonding layer on the substrate, and a plurality of abrasive particles placed on the bonding layer. The abrasive particles are screened into a non-magnetic or low magnetic content using a magnetic separation device. This innovation ensures that the abrasive particles used do not negatively impact polishing performance due to the presence of magnetic abrasive particles. Tian-Yeu Wu holds 1 patent for this invention.
Career Highlights
Tian-Yeu Wu has been associated with Kinik Company, where he has applied his expertise in developing advanced polishing technologies. His work has contributed to enhancing the efficiency and effectiveness of chemical mechanical polishing processes.
Collaborations
Due to space constraints, the collaborations section will be omitted.
Conclusion
Tian-Yeu Wu's innovative approach to chemical mechanical polishing through his patented technology demonstrates his commitment to improving industry standards. His contributions continue to influence the field positively.