Location History:
- Fort Collin, CO (US) (2007)
- Fort Collins, CO (US) (2011)
Company Filing History:
Years Active: 2007-2011
Title: Thomas W McKernan: Innovator in Integrated Circuit Design
Introduction
Thomas W McKernan is a notable inventor based in Fort Collins, CO (US). He has made significant contributions to the field of integrated circuit design, holding a total of 2 patents. His work focuses on innovative architectures and methods that enhance the functionality and efficiency of integrated circuits.
Latest Patents
McKernan's latest patents include "Platform architecture and method for making same" and "Integrated circuit with relocatable processor hardmac." The first patent provides an architecture for a platform that includes gates located in a central area of a die, a SerDes region, a Link Layer Controller region, and at least one RAM array. This design aims to support the application layer effectively. The second patent describes an integrated circuit layout featuring a base platform, a processor hardmac, and support memory. This layout is designed to optimize the arrangement of memory cells and interface pins, ensuring efficient communication between components.
Career Highlights
Thomas W McKernan is currently employed at LSI Corporation, where he continues to innovate in the field of integrated circuits. His work has been instrumental in advancing technology in this area, contributing to the development of more efficient and powerful electronic devices.
Collaborations
Throughout his career, McKernan has collaborated with notable colleagues, including Michael J Casey and Danny C Vogel. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Thomas W McKernan's contributions to integrated circuit design exemplify the spirit of innovation. His patents reflect a commitment to enhancing technology and improving the functionality of electronic devices. His work continues to influence the industry and inspire future advancements.