New Fairfield, CT, United States of America

Thomas W Baum


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Thomas W. Baum

Introduction

Thomas W. Baum is an accomplished inventor based in New Fairfield, Connecticut. He has made significant contributions to the field of chemical vapor deposition through his innovative work. With a focus on metal complex source reagents, Baum has developed a unique metalorganic complex that has applications in various industries.

Latest Patents

Baum holds one patent for his invention titled "Metal complex source reagents for chemical vapor deposition." This patent showcases his expertise in creating metalorganic complexes that enhance the efficiency and effectiveness of chemical vapor deposition processes.

Career Highlights

Baum is currently employed at Advanced Technology Materials, Inc., where he continues to push the boundaries of innovation in materials science. His work at this company has allowed him to explore new avenues in chemical engineering and contribute to advancements in technology.

Collaborations

Throughout his career, Baum has collaborated with notable colleagues, including Peter S. Kirlin and Duncan W. Brown. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Thomas W. Baum is a notable inventor whose work in chemical vapor deposition has made a lasting impact on the industry. His dedication to innovation and collaboration continues to inspire advancements in materials science.

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