Schenectady, NY, United States of America

Thomas R Fnthony


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Thomas R. Fnthony: Innovator in Chemical Vapor Deposition Technology

Introduction: Thomas R. Fnthony, based in Schenectady, NY, is a notable inventor recognized for his significant contributions to the field of chemical vapor deposition (CVD) technology. With a keen focus on enhancing the monitoring of material layers, Fnthony holds a patent that demonstrates his innovative approach to layer thickness determination.

Latest Patents: Fnthony's most prominent patent, titled "Method for determining thickness of chemical vapor deposited layers," presents a novel technique for monitoring the thickness of materials—particularly diamond layers—deposited through chemical vapor deposition. This method involves using a substrate equipped with at least one perforation of predetermined size, allowing for an accurate determination of the relationship between layer thickness in the perforation and the surface layer. By applying this relationship, the thickness of the surface layer can be effectively assessed, advancing the precision of CVD applications.

Career Highlights: Throughout his career, Thomas R. Fnthony has been associated with General Electric Company, a leading global technology company. His role there has allowed him to blend his expertise in chemical engineering with innovative practices, playing a crucial part in enhancing materials technology. His work contributes significantly to the advancements in various high-tech industries, particularly those relying on precision materials.

Collaborations: Fnthony has collaborated with esteemed colleagues, including James F. Fleischer and David Winfield Woodruff. Their combined expertise has fostered a stimulating research environment, promoting innovation in CVD processes. This collaboration not only enhances their individual research but also contributes to the collective advancement in material sciences within the company.

Conclusion: Thomas R. Fnthony exemplifies the spirit of innovation in the field of chemical vapor deposition technology. His patent serves as a testament to his contributions and reflects the potential for further developments in this critical area of materials science. As industries continue to evolve, inventors like Fnthony will remain at the forefront, driving technological advancements and shaping the future of engineering and manufacturing processes.

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