Apple Valley, MN, United States of America

Thomas P Jones, Ii


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Thomas P. Jones II: Innovator in De-Mating Apparatus Technology

Introduction

Thomas P. Jones II is an accomplished inventor based in Apple Valley, MN (US). He has made significant contributions to the field of engineering, particularly with his innovative designs that enhance the functionality of electrical connector assemblies. His work is characterized by a commitment to improving technology through practical solutions.

Latest Patents

Jones holds a patent for a de-mating apparatus, which is designed to facilitate the separation of electrical connector assemblies. The apparatus includes a first component and a second component, connected by a pair of parallel linear bearings. The first component features a pair of arms with lift surfaces that work in conjunction with the second component's arms, allowing for precise movement. This design enables the first pair of arms to move perpendicularly to the lift surfaces, effectively de-mating the electrical connectors with ease. He has 1 patent to his name.

Career Highlights

Throughout his career, Thomas P. Jones II has been associated with Ion Corporation, where he has applied his expertise in engineering and innovation. His role at the company has allowed him to develop and refine his inventions, contributing to advancements in the industry.

Collaborations

Jones has worked alongside his coworker, Chung C. Truong, fostering a collaborative environment that encourages the exchange of ideas and innovation. Their partnership has been instrumental in driving projects forward and enhancing the capabilities of their team.

Conclusion

Thomas P. Jones II exemplifies the spirit of innovation through his work on the de-mating apparatus and his contributions at Ion Corporation. His dedication to improving technology continues to inspire those in the engineering field.

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