Thomas P Carter

Title: Thomas P. Carter: Innovator in Photoresist Technology

Introduction

Thomas P. Carter is a notable inventor based in Laguna Beach, CA (US). He has made significant contributions to the field of photoresist technology, holding a total of 2 patents. His work has had a lasting impact on the industry, particularly in the development of advanced materials for photolithography.

Latest Patents

Carter's latest patents include innovations that enhance the performance of photoresists. One of his patents focuses on a positive photoresist containing dyes. This formulation includes an alkali-soluble novolac resin and a quinone diazide sensitizer, along with a dye that reduces reflective notching. The dye is compatible with the novolac resin/quinone diazide formulation, improving the overall effectiveness of the photoresist. Another significant patent is for a photoimageable composition with reduced cold flow due to salt-bridging. This composition utilizes a binder polymer with carboxyl groups and a metal chelate, which enhances the stability and performance of the dry film.

Career Highlights

Throughout his career, Thomas P. Carter has worked with prominent companies such as Morton International, Inc. and Morton Thiokol Inc. His experience in these organizations has allowed him to refine his expertise in materials science and photolithography.

Collaborations

Carter has collaborated with notable professionals in his field, including Sunit S. Dixit and Richard M. Lazarus. These collaborations have contributed to the advancement of technology in photoresist applications.

Conclusion

Thomas P. Carter's innovative work in photoresist technology has led to significant advancements in the field. His patents reflect a deep understanding of materials and their applications, making him a key figure in the industry.