Thomas Huber

Title: Thomas Huber: Innovator in Substrate Processing Technology

Introduction

Thomas Huber is a notable inventor based in Ossiach, Austria. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique patent that enhances the efficiency of processing chambers.

Latest Patents

Thomas Huber holds a patent for a substrate processing chamber and process gas flow deflector. This invention includes a chamber body, a substrate support designed to hold a substrate in place, and a pre-heat ring with a central opening. The process gas inlet directs gas laterally to flow over the pre-heat ring and substrate. The process gas flow deflector features a radially outer mounting portion and a radially inner blade-shaped deflection portion, which is shaped as a ring segment. This design allows for optimal overlap with the pre-heat ring, improving the processing efficiency.

Career Highlights

Thomas Huber is currently employed at Infineon Technologies AG, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of substrate processing chambers.

Collaborations

Thomas collaborates with talented coworkers, including Matthias Kuenle and Olaf Fiedler. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Thomas Huber's contributions to substrate processing technology exemplify the spirit of innovation. His patent reflects a commitment to enhancing processing efficiency in the semiconductor industry.