Thomas H Lawton

Title: Thomas H. Lawton: Innovator in Thermal Resistance Technologies

Introduction

Thomas H. Lawton is a notable inventor based in Wethersfield, CT (US). He has made significant contributions to the field of thermal resistance technologies, holding a total of 3 patents. His work focuses on enhancing the performance of silicon-based substrates through innovative protective coatings.

Latest Patents

Among his latest patents, Lawton has developed a "Thermal Resistant Environmental Barrier Coating." This process involves preparing a silicon-based substrate with a protective coating that exhibits improved thermal resistance at temperatures of up to at least 1500° C. Additionally, he has patented a "Method for Applying a Barrier Layer to a Silicon Based Substrate." This method utilizes a barium-strontium aluminosilicate barrier layer that effectively inhibits the formation of cracks in silicon-containing substrates.

Career Highlights

Thomas H. Lawton is currently employed at United Technologies Corporation, where he continues to innovate and develop advanced materials. His expertise in thermal resistance has positioned him as a key player in the field, contributing to the company's reputation for cutting-edge technology.

Collaborations

Lawton has collaborated with several talented individuals, including Harry E. Eaton and Tania Bhatia. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Thomas H. Lawton's contributions to thermal resistance technologies exemplify his dedication to innovation. His patents and work at United Technologies Corporation highlight his role as a leading inventor in this specialized field.