Company Filing History:
Years Active: 1989-1990
Title: Thomas Bluemel: Innovator in Photopolymerizable Recording Materials
Introduction
Thomas Bluemel is a notable inventor based in Erpolzheim, Germany. He has made significant contributions to the field of photopolymerizable recording materials, holding a total of 6 patents. His work primarily focuses on developing materials that enhance the production of photoresist layers and lithographic printing plates.
Latest Patents
Among his latest patents, Bluemel has developed innovative photopolymerizable recording materials containing a triazole sensitizer. These materials are particularly suitable for producing photoresist layers and lithographic printing plates. They consist of one or more photopolymerizable, olefinically unsaturated organic compounds, a polymeric binder, a photopolymerization initiator, and a color-forming system that includes a color former and a photooxidant. Additionally, a specific benzotriazole compound is used as a sensitizer, along with optional additives and auxiliary substances. Another of his recent patents involves photopolymerizable recording materials and photoresist layers that utilize a 4-phenylpyridine as a sensitizer, showcasing his innovative approach to enhancing photopolymerization processes.
Career Highlights
Thomas Bluemel is currently associated with BASF Aktiengesellschaft, a leading chemical company known for its innovative solutions. His work at BASF has allowed him to push the boundaries of photopolymer technology, contributing to advancements in various applications.
Collaborations
Throughout his career, Bluemel has collaborated with esteemed colleagues such as Reinhard Aldag and Andreas Boettcher. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Thomas Bluemel's contributions to photopolymerizable recording materials have established him as a key figure in the industry. His innovative patents and collaborations continue to influence advancements in lithographic printing and photoresist technologies.