Theodore A Blaske

Title: The Innovations of Theodore A. Blaske

Introduction

Theodore A. Blaske is a notable inventor based in Plano, TX (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

Blaske's latest patents include a method of passivating a semiconductor device utilizing dual layers. This innovative approach involves a multi-layer film that features a base coat of substantially undoped polycrystalline silicon in intimate contact with the substrate, bridging the semiconductor junction. The top coat consists of oxygen-doped polycrystalline silicon, which is disposed over the base coat. The method begins with the formation of a base layer from a controlled atmosphere of silane material, followed by the deposition of oxygen-doped polycrystalline silicon with the introduction of a gaseous oxygen donor. Another patent focuses on a passivated semiconductor device and the method of making it, emphasizing the same multi-layer film structure and process.

Career Highlights

Theodore A. Blaske has established himself as a key figure in the semiconductor industry. He is currently employed at Varo Semiconductor, Inc., where he continues to innovate and develop new technologies that advance the field. His expertise in semiconductor passivation techniques has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Blaske collaborates with various professionals in his field, including his coworker Ho Y. Yu. Their combined efforts contribute to the ongoing advancements in semiconductor technology.

Conclusion

Theodore A. Blaske's contributions to semiconductor technology through his innovative patents and career at Varo Semiconductor, Inc. highlight his importance in the field. His work continues to influence the development of more efficient and reliable semiconductor devices.