Leeds, United Kingdom

Terence Etherington



Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 16(Granted Patents)


Location History:

  • Roundhay, GB (1991)
  • Leeds, GB (1991 - 1993)

Company Filing History:


Years Active: 1991-1993

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5 patents (USPTO):Explore Patents

Title: Terence Etherington: Innovator in Radiation-Sensitive Polymers

Introduction

Terence Etherington is a notable inventor based in Leeds, GB. He has made significant contributions to the field of radiation-sensitive materials, holding a total of 5 patents. His work has advanced the technology used in lithographic printing, showcasing his expertise and innovative spirit.

Latest Patents

Etherington's latest patents include groundbreaking developments in radiation-sensitive polymers. One of his notable inventions is a radiation-sensitive polymer that features sulfonyl urethane side chains. This polymer is designed for the production of radiation-sensitive plates used in lithographic printing. The process involves reacting hydroxyl and/or epoxide groups of a polymer with azide-substituted carboxylic acids or their ester derivatives, along with the reaction of hydroxyl groups with sulfonyl isocyanates. Another significant patent focuses on bakeable aqueous photopolymers, which include azide-substituted aromatic ester groups and carboxylic or sulfonic acid groups. This innovation allows for the development of radiation-sensitive plates that can be baked to enhance their printing life.

Career Highlights

Throughout his career, Etherington has worked with prominent companies such as Vickers, Inc. and E.I. DuPont de Nemours and Company. His experience in these organizations has contributed to his expertise in developing advanced materials for printing technologies.

Collaborations

Etherington has collaborated with notable individuals in his field, including Rodney M. Potts and Victor Kolodziejczyk. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Terence Etherington's contributions to the field of radiation-sensitive polymers have significantly advanced lithographic printing technology. His innovative patents and collaborations reflect his dedication to improving materials used in the industry.

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