Company Filing History:
Years Active: 2022-2025
Title: Tejasvi Chunduri: Innovator in Free Radical Generation Technology
Introduction
Tejasvi Chunduri is a prominent inventor based in Ann Arbor, MI (US). She has made significant contributions to the field of free radical generation technology, holding 3 patents that showcase her innovative approach to solving complex problems in chemical reactions.
Latest Patents
Her latest patents include a "Free radical generation device and methods thereof" and a "Free radical generator and methods of use." The first patent describes a barrierless device that generates streamer discharge using solid and liquid electrodes, allowing for high-efficiency free radical generation. This device features a discharge gap with an inlet and outlet, where streamers emerge from the first electrode and propagate towards the second electrode. The interaction of the streamer heads with the discharge gas results in the generation of radicals, which can be utilized for fast chemical reactions or removed for external use. The second patent focuses on devices suitable for advanced oxidation methods that deploy OH* radicals and ozone to treat organic and inorganic pollutants. It combines two discharge devices to enhance chemical and biocidal characteristics, along with efficient mixing systems for transferring radicals to target fluids.
Career Highlights
Tejasvi Chunduri is currently associated with Somnio Global Holdings, LLC, where she continues to develop innovative technologies. Her work is characterized by a commitment to advancing the field of radical generation and its applications in environmental and chemical processes.
Collaborations
Tejasvi collaborates with notable professionals in her field, including Pravansu Sekhar Mohanty and Volodymyr Ivanovich Golota. These collaborations enhance her research and development efforts, contributing to the advancement of innovative solutions.
Conclusion
Tejasvi Chunduri's contributions to free radical generation technology exemplify her innovative spirit and dedication to addressing environmental challenges. Her patents reflect a deep understanding of chemical processes and a commitment to developing effective solutions.