Company Filing History:
Years Active: 2018-2021
Title: Tatsuya Nakazawa: Innovator in Ni-based Heat-Resistant Alloys
Introduction
Tatsuya Nakazawa is a prominent inventor based in Hiratsuka, Japan. He has made significant contributions to the field of materials science, particularly in the development of Ni-based heat-resistant alloys. With a total of 4 patents to his name, Nakazawa's work has garnered attention for its innovative approaches and practical applications.
Latest Patents
One of Nakazawa's latest patents involves a Ni-based heat-resistant alloy that includes Ir in a range of 5.0 mass % or more and 50.0 mass % or less, Al from 1.0 mass % to 8.0 mass %, and W from 5.0 mass % to 25.0 mass %, with the balance being Ni. This alloy features an L1-structured γ' phase present in the matrix and includes at least one of Zr or Hf within specified mass percentages. This invention demonstrates improved toughness compared to conventional Ni-based heat-resistant alloys and exhibits excellent ambient-temperature strength. Another patent focuses on a similar Ni-based heat-resistant alloy, incorporating Ru or Re within defined mass percentages, further enhancing its toughness and strength.
Career Highlights
Throughout his career, Nakazawa has worked with notable companies such as Tanaka Kikinzoku Kogyo Co., Ltd. and Tohoku Techno Arch Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials development and innovation.
Collaborations
Nakazawa has collaborated with esteemed colleagues, including Kunihiro Tanaka and Koichi Sakairi. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Tatsuya Nakazawa's contributions to the field of Ni-based heat-resistant alloys highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to improving the performance and reliability of heat-resistant materials, making a significant impact in various industrial applications.
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