Location History:
- Yokaichi, JP (2002)
- Higashiomi, JP (2008)
- Nagaokakyo, JP (2015 - 2016)
Company Filing History:
Years Active: 2002-2016
Title: Tatsuya Ishikawa: Innovator in Semiconductor Technology
Introduction
Tatsuya Ishikawa is a prominent inventor based in Nagaokakyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced ceramic materials. With a total of 5 patents to his name, Ishikawa's work has had a substantial impact on the industry.
Latest Patents
Ishikawa's latest patents include innovative technologies such as a ceramic powder designed for use in grain boundary insulated semiconductor ceramics. This ceramic powder boasts an excellent electrostatic discharge (ESD) withstanding voltage. Additionally, he has developed a semiconductor ceramic capacitor utilizing this ceramic powder, along with a method for its manufacturing. The ceramic powder is specifically tailored for use in a SrTiO-based grain boundary insulated semiconductor ceramic, featuring a specific surface area of 4.0 m/g or more and 8.0 m/g or less, with a cumulative 90% grain size D90 of 1.2 μm or less. Another notable patent involves a dielectric ceramic that contains a perovskite-type compound with barium and titanium as its main constituents, along with specific ratios of other elements.
Career Highlights
Ishikawa is currently employed at Murata Manufacturing Co., Ltd., a leading company in the electronics industry. His work at Murata has allowed him to focus on the development of cutting-edge materials that enhance the performance of electronic components. His innovative approach and dedication to research have positioned him as a key figure in his field.
Collaborations
Throughout his career, Ishikawa has collaborated with notable colleagues, including Hitoshi Takagi and Mitsutoshi Kawamoto. These collaborations have fostered a creative environment that has led to the successful development of various technologies.
Conclusion
Tatsuya Ishikawa's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in electronic materials and devices.