Tatsuo Nishihara

Title: Innovations of Tatsuo Nishihara

Introduction

Tatsuo Nishihara is a notable inventor based in Ehime, Japan. He has made significant contributions to the field of ion implantation technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is for a high-energy ion implanter. This device includes a beam generation unit with an ion source and a mass analyzer, a high-energy multi-stage linear acceleration unit that accelerates an ion beam to generate a high-energy ion beam, a high-energy beam deflection unit that changes the direction of the high-energy ion beam toward the wafer, and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The deflection unit is configured with multiple deflection electromagnets, and at least one horizontal focusing element is inserted between these electromagnets.

Another significant patent is for a high-frequency acceleration type ion acceleration and transportation apparatus. This apparatus is designed as a beamline following the acceleration of an ion beam by a high-frequency acceleration system. It features an energy analysis deflection electromagnet and a horizontal beam focusing element. Additionally, a double slit, consisting of an energy spread confining slit and an energy analysis slit, is positioned to optimize energy dispersion and beam size. This double slit performs energy separation and definition, reducing the energy spread of the ion beam while maintaining beam current.

Career Highlights

Throughout his career, Tatsuo Nishihara has worked with prominent companies such as Sen Corporation and Sumitomo Heavy Industries Ion Technology Co., Ltd. His experience in these organizations has contributed to his development as an inventor and innovator in the field of ion technology.

Collaborations

He has collaborated with notable individuals in his field, including Mitsuaki Kabasawa and Kazuhiro Watanabe. These collaborations have likely enriched his work and led to advancements in his projects.

Conclusion

Tatsuo Nishihara's contributions to ion implantation technology through his patents and career achievements highlight his role as a significant inventor in the industry. His innovative designs continue to influence the field and pave the way for future advancements.