Company Filing History:
Years Active: 1989
Title: Tasunori Ohno: Innovator in Ion Source Technology
Introduction
Tasunori Ohno is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of ion source technology. His innovative work has led to the development of a unique ion source application device.
Latest Patents
Tasunori Ohno holds 1 patent for his invention titled "Ion source application device." This device features a gas-tight plasma formation chamber that sustains plasma produced by high-frequency discharge. It includes a high-frequency coil that generates the discharge and mechanisms for extracting an ion beam from the produced plasma. Notably, the device is enhanced with an electron beam generator or a laser light generator, which serves to obtain electrons that act as seeds for initiating the high-frequency discharge.
Career Highlights
Ohno is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced technologies in the field of plasma and ion sources.
Collaborations
Tasunori Ohno has collaborated with talented coworkers, including Tomoe Kurosawa and Tadashi Sato. Their combined expertise has contributed to the advancement of their projects and innovations.
Conclusion
Tasunori Ohno's contributions to ion source technology exemplify the spirit of innovation. His patent and work at Hitachi, Ltd. highlight his role as a significant inventor in this specialized field.