Tasuku Ishizaka

Title: **Innovator Spotlight: Tasuku Ishizaka**

Introduction

Tasuku Ishizaka, an esteemed inventor based in Tsukuba, Japan, has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of three patents to his name, Ishizaka's innovations focus on advancing the production methods for ruthenium thin films, which are essential in numerous high-tech applications.

Latest Patents

Ishizaka's latest patents showcase his expertise and innovative spirit. One of his recent inventions is a chemical vapor deposition raw material that includes a dinuclear ruthenium complex. This material is uniquely designed for the production of ruthenium thin films and compounds through a CVD method. His invention features a dinuclear ruthenium complex, where carbonyl and a nitrogen-containing organic ligand are coordinated to two rutheniums, providing a solution that produces high-purity ruthenium thin films with a low melting point and moderate thermal stability. This raw material is particularly advantageous for use in the electrodes of various devices.

Additionally, Ishizaka developed a method for purifying dodecacarbonyl triruthenium (DCR), critical for CVD processes. His purification method ensures that the DCR serves as a raw material without contaminating thin films with impurities. By controlling the dissolved oxygen concentration in the solvent during the dissolution stage to be 0.2 mg/L or lower, this method effectively separates trace impurities from DCR. This technique improves the integrity of ruthenium thin films, enhancing their performance and reliability.

Career Highlights

Tasuku Ishizaka currently works for Tanaka Kikinzoku Kogyo Co., Ltd., a company recognized for its quality in precious metal manufacturing and technology. His work at Tanaka Kikinzoku has allowed him to push the boundaries of material science, particularly in the field of chemical vapor deposition technology.

Collaborations

Throughout his career, Ishizaka has collaborated with notable professionals in the field, including Hirofumi Nakagawa and Hirofumi Ishida. These collaborations have fostered a rich exchange of ideas and research, leading to advancements in technology and processes related to CVD and thin film applications.

Conclusion

Tasuku Ishizaka's contributions to the field of chemical vapor deposition have not only advanced manufacturing techniques but have also set new standards for quality and purity in ruthenium thin films. As he continues to innovate within Tanaka Kikinzoku Kogyo, his work remains pivotal for various technological applications, solidifying his reputation as a leading figure in materials science.