Location History:
- Higashi-Osaka, JP (1978)
- Nara, JP (1990 - 1997)
Company Filing History:
Years Active: 1978-1997
Title: Tanejiro Ikeda: Innovator in Sputtering Technology
Introduction
Tanejiro Ikeda is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 5 patents. His work has been instrumental in advancing manufacturing processes, particularly in the production of film capacitors.
Latest Patents
Ikeda's latest patents include a sputtering apparatus designed for performing sputtering operations using a rectangular target made of ferromagnetic material. This innovative apparatus features an electrode with first permanent magnets on each side edge of the target's front surface, with opposing polarities. Additionally, second permanent magnets are positioned on the rear surface of the target, also with opposing polarities. This unique configuration enhances the efficiency of the sputtering process. Another notable patent is a method for manufacturing a film capacitor, which involves a two-stage application of radio frequency power for etching the laminated film capacitor body. The first stage utilizes a larger power, while the second stage employs a smaller power, optimizing the electrode connection process.
Career Highlights
Tanejiro Ikeda is currently employed at Matsushita Electric Industrial Co., Ltd., where he continues to innovate and develop new technologies. His expertise in sputtering technology has positioned him as a key figure in the industry, contributing to advancements that benefit various applications.
Collaborations
Ikeda has collaborated with notable coworkers, including Tadashi Kimura and Kunio Oshima. Their combined efforts have led to significant developments in their respective fields, further enhancing the impact of their work.
Conclusion
Tanejiro Ikeda's contributions to sputtering technology and film capacitor manufacturing demonstrate his innovative spirit and dedication to advancing engineering practices. His patents reflect a commitment to improving efficiency and effectiveness in manufacturing processes.