Location History:
- Hachioji, JP (2019)
- Tsu, JP (2019)
Company Filing History:
Years Active: 2019
Title: Takuya Suguri: Innovator in Substrate Treatment Technology
Introduction
Takuya Suguri is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of substrate treatment technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of substrate treatment apparatuses.
Latest Patents
One of Takuya Suguri's latest patents is a substrate treatment apparatus that includes a lower electrode and an upper electrode. This innovative apparatus features a first AC power supply connected to the upper electrode, which supplies AC power at a first frequency. Additionally, a second AC power supply is connected to the upper electrode, supplying AC power at a second frequency that is lower than the first frequency. The design incorporates an internal electrode within the lower electrode, a filter circuit connected to the internal electrode, and a DC power supply linked to the internal electrode via the filter circuit. The filter circuit is designed with a first filter circuit that becomes low impedance with respect to AC power at the first frequency compared to AC power at the second frequency, and a second filter circuit that becomes low impedance with respect to AC power at the second frequency compared to AC power at the first frequency.
Career Highlights
Takuya Suguri is currently employed at Asm IP Holding B.V., where he continues to develop innovative technologies in substrate treatment. His expertise and dedication to his work have positioned him as a key figure in his field.
Collaborations
Throughout his career, Takuya has collaborated with notable colleagues, including Yozo Ikedo and Toshiharu Watarai. These collaborations have contributed to the advancement of technology in substrate treatment.
Conclusion
Takuya Suguri is a distinguished inventor whose work in substrate treatment technology has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to improving substrate treatment processes.