Shinagawa, Japan

Takuya Ohwa

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.7

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: Takuya Ohwa: Innovator in Optimization Technologies

Introduction

Takuya Ohwa is a prominent inventor based in Shinagawa, Japan. He has made significant contributions to the field of optimization technologies, holding 2 patents that showcase his innovative approach to problem-solving in computational methods.

Latest Patents

Ohwa's latest patents include an "Optimization apparatus, non-transitory computer-readable storage medium for storing optimization program, and optimization method." This method involves partitioning learning data into subsets, executing regularization processing, and extracting models based on error ratios. His second patent, "Computer-readable recording medium, estimation method and estimation device," describes a search device that determines user preferences based on past responses, enhancing the accuracy of inquiries presented to respondents.

Career Highlights

Takuya Ohwa is currently employed at Fujitsu Corporation, where he applies his expertise in optimization technologies. His work has been instrumental in advancing the capabilities of computational systems and improving user experience through innovative methods.

Collaborations

Ohwa collaborates with notable colleagues, including Hidetoshi Matsuoka and Yuri Nakao, who contribute to the development of cutting-edge technologies in their respective fields.

Conclusion

Takuya Ohwa's contributions to optimization technologies reflect his dedication to innovation and problem-solving. His patents not only advance the field but also demonstrate the potential for practical applications in various industries.

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