Company Filing History:
1 out of 10 
1 out of 74 Years Active: 2017
Title: Takuya Iwasaki: Innovator in Plasma Processing Technology
Introduction
Takuya Iwasaki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique system that enhances the predictability of processing shapes formed by plasma processes.
Latest Patents
Iwasaki holds a patent for a "System, method, and program for predicting processing shape by plasma process." This invention includes databases for apparatus conditions, incident ions, incident radicals, actual measurements, material properties, and surface reactions. It also features a trajectory calculation unit and a surface shape calculation unit. The trajectory calculation unit computes the trajectories of ions incident on the substrate surface, utilizing data from various databases and measurements from an on-wafer monitoring sensor. Subsequently, the surface shape calculation unit determines the changes in shape based on the trajectory calculations and material property data.
Career Highlights
Throughout his career, Takuya Iwasaki has worked with esteemed organizations such as Mizuho Information & Research Institute, Inc. and Tohoku Techno Arch Co., Ltd. His experience in these companies has allowed him to refine his expertise in plasma processing and related technologies.
Collaborations
Iwasaki has collaborated with notable colleagues, including Seiji Samukawa and Kohei Ono. Their joint efforts have contributed to advancements in the field and have fostered a collaborative environment for innovation.
Conclusion
Takuya Iwasaki's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patent and career achievements highlight his role as a significant figure in the field.