Osaka, Japan

Takuya Akio


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Takuya Akio - Innovator in Vacuum Vapor Deposition Technology

Introduction

Takuya Akio is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of vapor deposition technology, particularly through his innovative patent. His work has implications for various industries that rely on advanced coating techniques.

Latest Patents

Takuya Akio holds a patent for a vacuum vapor deposition apparatus. This improved apparatus features an evaporation tank designed to hold and evaporate vapor deposition material. It includes a hood that covers the top of the evaporation tank and extends horizontally outward. The apparatus is equipped with inlet and outlet ports for a band to be vapor-deposited, which penetrate the central portion of the hood's extension. A vacuum tank entirely covers the evaporation tank and hood, incorporating sealing devices for the band. This design allows for simultaneous vapor deposition on both the front and rear surfaces of the band. Additionally, the apparatus includes a vapor amount control device and a vapor-deposited surface area control device, enabling the deposition of varying thicknesses on the band.

Career Highlights

Throughout his career, Takuya Akio has worked with prominent companies such as Mitsubishi Jukogyo Kabushiki Kaisha and Nisshin Steel Co., Ltd. His experience in these organizations has contributed to his expertise in vapor deposition technologies and their applications.

Collaborations

Takuya Akio has collaborated with notable colleagues, including Kenichi Yanagi and Toshio Taguchi. These partnerships have likely enhanced his research and development efforts in the field.

Conclusion

Takuya Akio's contributions to vacuum vapor deposition technology demonstrate his innovative spirit and commitment to advancing industrial processes. His patent reflects a significant step forward in the efficiency and effectiveness of vapor deposition methods.

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