Taketo Matsuda

Title: Taketo Matsuda: Innovator in Semiconductor Technology

Introduction

Taketo Matsuda is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming insulating films. His innovative approaches have led to advancements in semiconductor device manufacturing.

Latest Patents

Taketo Matsuda holds 1 patent for his invention titled "Method of forming insulating film, method of manufacturing semiconductor device and their controlling computer program." This patent describes a process where a semiconductor substrate with a groove is placed in a plasma generating reaction chamber. The method involves introducing silicon, oxygen, and hydrogen-containing gases into the chamber as process gases. The invention establishes critical gas-flow ratios to control the formation of insulating films buried in grooves, enhancing the efficiency of semiconductor devices.

Career Highlights

Matsuda has had a successful career at Kabushiki Kaisha Toshiba, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's reputation but has also played a vital role in the broader semiconductor industry.

Collaborations

Throughout his career, Taketo Matsuda has collaborated with notable colleagues, including Hiroshi Sato and Rempei Nakata. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Taketo Matsuda's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his importance in the industry. His work continues to influence advancements in semiconductor manufacturing processes.