Odawara, Japan

Takesi Nakamura


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Hino, JP (1996)
  • Kanagawa-ken, JP (1999)
  • Odawara, JP (2001)

Company Filing History:


Years Active: 1996-2001

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3 patents (USPTO):Explore Patents

Title: The Innovations of Takesi Nakamura

Introduction

Takesi Nakamura is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of photography through his innovative work on light-sensitive materials. With a total of 3 patents, Nakamura continues to push the boundaries of photographic technology.

Latest Patents

One of Nakamura's latest patents is focused on a silver halide photographic light-sensitive material. This invention comprises at least one light-sensitive silver halide emulsion layer and at least one non-light-sensitive layer on a support. The non-light-sensitive layer contains porous fine particles of 400 mg per 1 m² or more, and the material is hardened utilizing at least one of vinyl sulfone hardener, carboxyl-activating hardener, or polymeric hardener. This advancement enhances the performance and durability of photographic materials.

Career Highlights

Nakamura is currently employed at Konica Corporation, where he applies his expertise in developing innovative photographic solutions. His work has been instrumental in advancing the technology used in photography, making it more efficient and effective.

Collaborations

Some of his notable coworkers include Katsumasa Yamazaki and Osamu Ishige. Their collaboration has contributed to the success of various projects within the company.

Conclusion

Takesi Nakamura's contributions to the field of photography through his patents and work at Konica Corporation highlight his role as a significant innovator. His advancements in silver halide photographic materials continue to influence the industry.

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