Company Filing History:
Years Active: 1997
Title: The Innovative Contributions of Takeshi Hattori
Introduction
Takeshi Hattori is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of substrate cleaning technology. His innovative approach has led to the development of a unique method that enhances the efficiency of cleaning processes.
Latest Patents
Takeshi Hattori holds 1 patent for his invention titled "Method of cleaning substrate." This patent describes a process that involves cleaning the surface of a substrate using an acidic solution, oxidizing solution, or alkaline solution. A key aspect of this method is the removal of the natural oxide film that forms on the substrate's surface, which is crucial for ensuring optimal cleaning results.
Career Highlights
Hattori is currently employed at Sony Corporation, a leading technology company known for its innovative products and solutions. His work at Sony has allowed him to apply his expertise in substrate cleaning, contributing to the company's advancements in various technologies.
Collaborations
Throughout his career, Takeshi Hattori has collaborated with talented individuals such as Koichiro Saga and Sakuo Koyata. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Takeshi Hattori's contributions to substrate cleaning technology exemplify the impact of innovative thinking in the field of engineering. His patent and work at Sony Corporation highlight the importance of continuous improvement in industrial processes.