Company Filing History:
Years Active: 1997
Title: The Innovations of Takemitsu Kunio
Introduction
Takemitsu Kunio is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in electronic devices.
Latest Patents
Takemitsu Kunio holds a patent for a method of fabricating a semiconductor device that incorporates a refractory metal. This method involves implanting ions, such as silicon, into an active region to create a damage portion. Following this, a refractory metal is deposited on the damaged area, and annealing is performed to form a refractory metal silicide layer. This silicide layer is crucial as it is formed by the reaction of the refractory metal with silicon in the damaged portion of the active region. He has 1 patent to his name.
Career Highlights
Kunio is currently employed at NEC Corporation, a leading technology company in Japan. His work focuses on enhancing semiconductor fabrication techniques, which are essential for the development of modern electronic devices. His expertise in this area has made him a valuable asset to his team.
Collaborations
Some of his notable coworkers include Tadahiko Horiuchi and Takashi Ishigami. Their collaborative efforts contribute to the innovative projects at NEC Corporation.
Conclusion
Takemitsu Kunio's contributions to semiconductor technology exemplify the importance of innovation in the electronics industry. His patented methods continue to influence the development of advanced semiconductor devices.