Location History:
- Hyogo, JP (1988)
- Kobe, JP (1987 - 1991)
Company Filing History:
4 out of 11 
3 out of 21,351 
1 out of 1 Years Active: 1987-1991
Title: Innovations by Takeki Hata in Semiconductor Processing
Introduction
Takeki Hata is a notable inventor based in Kobe, Japan, recognized for his contributions to semiconductor processing technology. He holds a total of five patents, showcasing his innovative approach to improving the efficiency and effectiveness of semiconductor wafer treatment.
Latest Patents
Hata's latest patents focus on a processing method for semiconductor wafers. This method involves a cleaning and gettering technique that utilizes frozen particles blasted at the surface of a semiconductor wafer. The process includes forming ultrafine frozen particles through various methods, such as spraying a mist of water into a chamber filled with liquid nitrogen or cold nitrogen gas. These methods freeze the mist to create ice particles, which are then used to clean or getter the semiconductor wafers. Additionally, the invention allows for the inclusion of abrasive particles like silica powder when the frozen particles are used for gettering.
Career Highlights
Throughout his career, Takeki Hata has worked with prominent companies, including Taiyo Sanso Co., Ltd. and Mitsubishi Denki Kabushiki Kaisha. His experience in these organizations has contributed significantly to his expertise in semiconductor technology.
Collaborations
Hata has collaborated with notable colleagues such as Masuo Tada and Takaaki Fukumoto, further enhancing his work in the field of semiconductor processing.
Conclusion
Takeki Hata's innovative methods in semiconductor wafer processing demonstrate his significant impact on the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.