This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Fuji Electric Co., Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Takehito Wada: Innovator in Film Forming Technology
Introduction
Takehito Wada is a prominent inventor based in Funabashi, Japan. He has made significant contributions to the field of film forming technology, particularly through his innovative patent that enhances the quality of film deposition processes.
Latest Patents
Wada holds a patent for a film forming method and film forming apparatus. This invention involves a process performed on a substrate within a deposition chamber. The design includes a first electrode that is grounded and a second electrode facing the first. A radio frequency power supply delivers power to the second electrode, while a DC power supply provides a bias voltage. The control unit adjusts the bias voltage to be less than the potential of the second electrode when radio frequency power is supplied, but without supplying the bias voltage. This method improves film quality while maintaining a high deposition rate.
Career Highlights
Wada is associated with Fuji Electric Co., Ltd., where he has been instrumental in advancing film forming technologies. His work has been recognized for its impact on the efficiency and quality of film deposition processes.
Collaborations
Wada collaborates with Hideaki Matsuyama, contributing to the development of innovative solutions in their field.
Conclusion
Takehito Wada's contributions to film forming technology exemplify the importance of innovation in enhancing industrial processes. His patent reflects a commitment to improving quality while optimizing efficiency in film deposition.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile