Itami, Japan

Takashi Yoshida


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 1995

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Takashi Yoshida: Innovator in Ultra-Thin Film Laminate Technology

Introduction

Takashi Yoshida is a prominent inventor based in Itami, Japan. He is known for his significant contributions to the field of materials science, particularly in the development of advanced coating films. His innovative work has led to the creation of a unique ultra-thin film laminate that enhances the performance of cutting tools and electronic components.

Latest Patents

Yoshida holds a patent for an ultra-thin film laminate that significantly improves the wear resistance of cutting tools and other machine parts. This coating film is designed to provide excellent protective qualities for electric and electronic components. The invention features a laminate structure that alternates layers of nitride or carbonitride with other compounds, achieving a cubic crystalline X-ray diffraction pattern. The layers are meticulously crafted with a thickness ranging from 0.2 to 50 nm, ensuring optimal performance in various applications.

Career Highlights

Takashi Yoshida is associated with Sumitomo Electric Industries, Limited, where he has made substantial contributions to the company's research and development efforts. His work has not only advanced the field of wear-resistant materials but has also positioned the company as a leader in innovative technologies.

Collaborations

Yoshida has collaborated with notable colleagues, including Makoto Setoyama and Motoyuki Tanaka. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the quality of their research.

Conclusion

In summary, Takashi Yoshida is a distinguished inventor whose work in ultra-thin film laminate technology has made a significant impact on the industry. His innovative approach and dedication to advancing materials science continue to inspire future developments in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…