Asaka, Japan

Takashi Saida


Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 166(Granted Patents)


Location History:

  • Asaka, JA (1976)
  • Asaka, JP (1978 - 1983)
  • Saitama, JP (1985)

Company Filing History:


Years Active: 1976-1985

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6 patents (USPTO):

Title: Takashi Saida: Innovator in Photosensitive Materials

Introduction

Takashi Saida is a notable inventor based in Asaka, Japan, recognized for his contributions to the field of photosensitive materials. With a total of six patents to his name, Saida has made significant advancements that enhance the performance of photographic materials.

Latest Patents

One of Saida's latest patents involves photosensitive materials that possess improved antistatic properties. This innovation includes a silver halide photosensitive material that features a base support with an electrically conductive layer made from fine particles of various crystalline metal oxides. This layer effectively prevents the generation of static charges, even in low humidity conditions, without compromising the photographic qualities of the material. Another significant patent focuses on an electrically-conductive support for electrophotographic mediums, which comprises a support and an electrically-conductive layer. This layer contains a binder and fine particles of electrically-conductive metal oxides, ensuring optimal performance in electrophotographic applications.

Career Highlights

Throughout his career, Takashi Saida has worked with prominent companies such as Fuji Photo Film Company, Limited and Rank Xerox Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in the realm of photosensitive materials.

Collaborations

Saida has collaborated with notable colleagues, including Masaaki Takimoto and Masataka Murata, contributing to the advancement of technology in his field.

Conclusion

Takashi Saida's work in the development of photosensitive materials showcases his innovative spirit and dedication to enhancing photographic technology. His patents reflect a commitment to improving the functionality and reliability of these materials in various applications.

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