Takashi Bannai

Title: Takashi Bannai: Innovator in Radiation-Sensitive Resin Composition

Introduction

Takashi Bannai is a notable inventor based in Haibara-gun, Japan. He has made significant contributions to the field of radiation-sensitive materials, particularly through his innovative patent.

Latest Patents

Bannai holds a patent for a "Method for producing radiation-sensitive resin composition and pattern forming method." This method involves producing a composition using a stirring device equipped with a stirring tank and a stirrer. The process includes a mixing step where a resin, an acid generator, and a solvent are charged into the stirring tank. The stirring step involves stirring the mixture using the stirrer, with specific ratios and arrangements of components to achieve optimal results. His patent is particularly noteworthy for its detailed specifications regarding the stirring elements and their arrangement.

Career Highlights

Bannai is currently associated with Fujifilm Corporation, where he applies his expertise in developing advanced materials. His work has contributed to the company's reputation for innovation in the field of imaging and materials science.

Collaborations

Throughout his career, Bannai has collaborated with talented individuals such as Takumi Tanaka and Takamitsu Tomiga. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Takashi Bannai's contributions to the field of radiation-sensitive resin compositions highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.